A 32 by 32 Electroplated Metallic Micromirror Array
نویسنده
چکیده
−This paper presents the design, fabrication and characterization of a 32 by 32 electroplated micromirror array on a glass, a low cost substrate. Approaches taken in this work for the fabrication of micromachined mirror arrays include a line addressing scheme, a seamless array design for high fill factor, planarization techniques of polymeric interlayers, a high yield methodology for the removal of sacrificial polymeric interlayers, and low temperature and chemically safe fabrication techniques. The micromirror is fabricated by aluminum and the size of a single micromirror is 200 μm × 200 μm. Static deflection test of the micromirror has been carried out and pull-in voltage of 44 V and releasing voltage of 30V was found. Index Terms− micromirror array, finite element modeling, electrostatic, electroplating, sacrificial layer
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